Pulsed and pulsed bias sputtering principles and applications Edward V. Barnat and Toh-Ming Lu.
Material type:
TextPublication details: Massachusetts : Kluwer Academic Publishers, 2003.Description: x, 155 pISBN: - 9781402075438
- 621.38152P
| Item type | Current library | Call number | Copy number | Status | Notes | Date due | Barcode | |
|---|---|---|---|---|---|---|---|---|
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Central Library, IISER Bhopal | 621.38152 B252P (Browse shelf(Opens below)) | 1 | Available | Reserve | 2829 |
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| 621.3815 C457L3 Linear integrated circuits | 621.3815 C457L4 Linear Integrated circuits | 621.38151 R721H Handbook of electron tube and vacuum techniques | 621.38152 B252P Pulsed and pulsed bias sputtering principles and applications | 621.38152 EL26 Electronic structure of metal-semiconductor contacts | 621.38152 G155I Intense terahertz excitation of semiconductors | 621.38152 L972F2 Fundamentals of carrier transport |
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